Archivo: Spinner

Descripción: A spinner is used to apply a thin even coating of photoresist to a silicon wafer so that the pattern on a photomask can be transferred and a circuit can be fabricated. The image shows a wafer of 6" (125 mm) diameter that has been mounted on the vacuum chuck and is ready for spinning. The user dispenses a drop of photoresist in the center of the wafer and the centrifugal force spreads the fluid into an even film, eliminating excess photoresist at the edge of the wafer in the process. Note that the light in the room really is yellow.
Título: Spinner
Créditos: Photo taken at HP Labs by Alison Chaiken.
Autor(a): Alison Chaiken
Permiso: Puedes usar la licencia que prefieras.
Términos de Uso: Creative Commons Attribution-Share Alike 3.0
Licencia: CC-BY-SA-3.0
Enlace de Licencia: http://creativecommons.org/licenses/by-sa/3.0/
¿Se exige la atribución?: Sí